Thank you very much for your participation in Photomask Japan2026.

Thanks to your kind support, PMJ2026 was successfully concluded. We would greatly appreciate your cooperation in completing the survey for future improvement.
Photomask Japan2026にご参加いただき心より御礼申し上げます。今後の参考のため、アンケートにご協力賜れますと幸甚でございます。
◆Survey／アンケート
◆Receipt or invoce ・ ◆領収書、請求書

Date: April 8(Wed.)-10(Fri.), 2026.
Venue:  Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan


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Program Summary of Past PMJs (Written in Japanese)


PMJ2025学会報告   PMJ2024学会報告   PMJ2023学会報告   PMJ2022学会報告   PMJ2021学会報告

Photomask Japan 2026 is the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion.


Photomask Japan Secretariat

c/o PCO, Inc.
2-25 Sakurabashidori, Toyama, 930-0004
E-mail: pmj@pcojapan.jp
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