Welcome to SiPhotonIC!

SiPhotonIC is a high-tech photonic integration company that offers rapid prototyping services of silicon Photonic Integrated Circuits (PICs).

SiPhotonIC focuses on providing the best service and fabrication of your silicon PICs with:

• Very quick delivery times that outperform certain MPW and volume production delays. We offer two delivery options (depending on the complexity):
  • Fast delivery time (typically 1.5 – 3.5 months FRO)
  • Rapid cycle premiums (with a pay-the-extra-only-if-we-ship policy)
• Verified performance for our PDK components (NRE is also possible for big projects with custom processes)
• High-precision fabrication verified each time by SEM imaging

You can design and submit your prototyping project by using:

• Our standard SOI platforms:
  We have two SOI platforms in place, 220 nm- and 250 nm-thick SOI for 1550 nm applications, both with verified photonic components and PDK libraries.
• Custom components, stacks & processes
  SiPhotonIC allows you also to submit your custom projects for rapid prototyping:
  
  • Custom-designed photonic components based on our platforms’ generic specifications (220 nm / 250nm SOI)
  • Custom integration stacks with the materials and layers of your choice
  • Custom processes on your provided chips/wafers or part of your fabrication procedure

You can choose from many flexible lithographic, deposition and etching processes. The main lithographic processes offered are:

• E-beam lithography (EBL) for taping out designs that require high-resolution (>20nm) for their structures
• Deep UV (DUV) lithography for taping out designs in volumes that require >200nm resolution for their structures
• Combined EBL & DUV lithography for taping out designs in medium volume but also with high-resolution requirements (<20 nm) for some of their structures.
• Maskless UV lithography for certain fabrication steps and structures with very loose resolution requirements on μm scale.

Many research groups and companies have trusted so far our technology and knowhow to prototype their complex silicon PICs that were published for their novel applications in Science, Nature Communications, Nano Letters, Nanoscale, Scientific Reports, and so on.
For more details, please see PUBLICATIONS tab.

State-of-the-art cleanroom

SiPhotonIC is using the state-of-the-art DTU Danchip National Center for Micro- and Nanofabrication (DTU Danchip)  for the prototyping service.

DTU Nanolab occupies 1350 m2 state-of-the-art class 10-100 ISO-9001 certified cleanroom facilities and is equipped with advanced machines for photonic integration, including: a 100kV JOEL JBX-9500FSZ E-Beam Writer, a Canon FPA-3000EX4 DUV Stepper Lithography writer, an Advanced Silicon Etcher, an STS plasma-enhanced chemical vapor deposition (PECVD) and others.

For more details, please see our SERVICES tab.