CleWin3

CleWin3 is a professional 2D layout editor for micro- and nanofabrication, developed by WieWeb Software. Built for photomask design in MEMS, ICs, photonics, and microfluidics, it provides a fast, Windows-native environment for creating precise, hierarchical geometries across multiple layers. CleWin3 supports standard mask file formats such as GDSII and CIF for smooth handoff to foundries and compatibility with e-beam and photolithography workflows. Productivity features include robust snapping and alignment, array and transformation tools, customizable layer management, boolean and sizing operations, and script-driven automation for parameterized structures and batch tasks. Its lightweight footprint, responsive editing, and approachable learning curve make it a practical choice for research labs and small production lines that need reliable mask layout without the overhead of full IC CAD suites.

CleWin3 is developed by WieWeb software. The most popular version of this product among our users is 3.2. The name of the program executable file is CleWin3.exe.