The TESCAN Amber X2 system is a Xe-Plasma FIB that enables the modification of samples with a Xe-Plasma. Significantly higher ablation rates are possible compared to conventional focused ion beam systems with a gallium beam.
Configuration
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Operation Voltage:
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High Tension SEM: 50 V - 30 kV
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High Tension FIB: 500 V - 30 kV
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Source
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FEG (Schottky)
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Xenon Plasma Source
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Imaging Detectors:
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chamber SE
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in-column axial BSE/SE (Axial)
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in-column energy-filtered multidetector (MD)
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SITD
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Retractable LE-BSE detector with shutter
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Gas Injection System (GIS)
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GIS (W)
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GIS (C)
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Manipulators
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Omniprobe 400 with independent x,y, z motion and rotation
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Tescan OptiLift piezo controlled with motorized concentric rotation
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Analysis
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4D-STEM in SEM pixelated detector
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Resolution
| 30 kV | 15 kV | 1 kV | |
| Electron Beam [nm] | 0.8 (field free) | 0.9 (field free) | 1.4 (field free) |
| Xenon Ion Beam [nm] | 10 | 200 |
Imaging, Analysis and Sample Preparation Techniques
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SE & BSE SEM analysis
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STEM imaging
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4D-STEM in SEM
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3D Slice & View tomography
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TEM sample preparation
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Nanoscale deposition and contacting

