Tescan Amber X 2

The TESCAN Amber X2 system is a Xe-Plasma FIB that enables the modification of samples with a Xe-Plasma. Significantly higher ablation rates are possible compared to conventional focused ion beam systems with a gallium beam.

Configuration

  • Operation Voltage:

    • High Tension SEM: 50 V - 30 kV

    • High Tension FIB: 500 V - 30 kV      

  • Source

    • FEG (Schottky)

    • Xenon Plasma Source

  • Imaging Detectors:

    • chamber SE

    • in-column axial BSE/SE (Axial)

    • in-column energy-filtered multidetector (MD)

    • SITD

    • Retractable LE-BSE detector with shutter

  • Gas Injection System (GIS)

    • GIS (W)

    • GIS (C)

  • Manipulators

    • Omniprobe 400 with independent x,y, z motion and rotation 

    • Tescan OptiLift piezo controlled with motorized concentric rotation

  • Analysis

    • 4D-STEM in SEM pixelated detector

Resolution

  30 kV 15 kV 1 kV
Electron Beam [nm] 0.8 (field free) 0.9 (field free) 1.4 (field free)
Xenon Ion Beam  [nm] 10   200

 

Imaging, Analysis and Sample Preparation Techniques      

  • SE & BSE SEM analysis

  • STEM imaging

  • 4D-STEM in SEM

  • 3D Slice & View tomography

  • TEM sample preparation

  • Nanoscale deposition and contacting

Tescan Solaris X KIT
Tescan Amber X 2