Month: April 2026

Governor Hochul Celebrates Official Opening of Major New R&D Center at NY Creates’ Albany Nanotech Complex

View the original Office of Governor Kathy Hochul News Release here.
View the SCREEN News Release here.

Builds on Governor Hochul’s Investment of $1 Billion, Leveraging $9 Billion in Industry Investment, Albany NanoTech Complex Continues to Act as Growth Magnet

Governor Kathy Hochul today announced that NY Creates (the New York Center for Research, Economic Advancement, Technology, Engineering, and Science) and leading Japanese semiconductor supply chain company SCREEN held a ribbon-cutting ceremony to celebrate the opening of SCREEN’s Advanced Technology Center of America, LLC (SCREEN ATCA). This partnership between NY Creates and SCREEN brings another international leader in advanced semiconductor technologies to the Capital Region, and further cements New York State’s position as a global leader in semiconductor innovation and manufacturing.

“The opening of SCREEN ATCA marks yet another major milestone for New York’s globally-recognized semiconductor manufacturing industry,” Governor Hochul said. “This partnership allows New York to continue to expand on semiconductor innovation, creating good-paying jobs and strengthening the communities around the center.”

SCREEN’s new leading-edge research and development center is located at NY Creates’ Albany NanoTech Complex—the largest and most advanced semiconductor R&D facility of its kind in North America. Researchers at the Center will work to advance semiconductor technologies in the United States, marking the culmination of a strategic international partnership to strengthen collaboration around chip innovation and deepen economic ties between the U.S. and Japan.

This partnership was made possible by Governor Hochul’s $1 billion investment to build and equip NanoFab Reflection, a next generation R&D facility at NY Creates. SCREEN ATCA will leverage state-of-the-art cleanroom space within NanoFab Reflection and includes more than $75 million in initial investment expected during the first three years of a planned ten-year engagement.

Empire State Development President, CEO and Commissioner Hope Knight said, “Under Governor Hochul’s leadership, New York State is making bold, strategic investments in the industries of the future — we are not only driving innovation, but also building the foundation for the jobs of tomorrow. From semiconductors to advanced research and emerging technologies, these efforts and global partnerships are creating new opportunities for New Yorkers, strengthening our competitiveness, and positioning our communities to thrive in a rapidly evolving economy.”

NY Creates President and CEO Dave Anderson said, “This ribbon-cutting ceremony signifies more than just a new space at NY Creates, it symbolizes a shared vision to expand semiconductor R&D in the region, advance the workforce of tomorrow, and reinforce global competitiveness in this critical industry. With SCREEN ATCA now operational at our Albany NanoTech Complex, we are unlocking exciting opportunities for collaboration, reflecting a shared commitment to catalyze semiconductor innovation in New York for the U.S. and the world. We look forward to working closely with our ATCA partners to enable their long-term success.”

SCREEN Holdings President and CEO and SCREEN ATCA Chairman Masato Goto said, “The establishment of the global R&D hub in Albany has been my long-term dream, incubated since I was the president of SCREEN’s SPE business. This investment will accelerate elemental technology validation and equipment development, giving us a further competitive edge and enabling us to deliver greater value to our customers.”

SCREEN ATCA President Ian Brown said, “SCREEN is excited to deepen our 20-year engagement with the NY Creates Albany NanoTech site. With SCREEN ATCA being an active tenant, it expands our capabilities and capacity to develop semiconductor manufacturing equipment, processes and applications internally, with Albany NanoTech onsite stakeholders and our U.S. and global partners.”

Through this initiative, NY Creates and SCREEN ATCA intend to connect leading high-tech organizations in both the U.S. and Japan to leverage their networks and drive innovation in SCREEN’s semiconductor R&D focus areas, including semiconductor wet etch and cleaning processes with a range of wet processing, coat/develop, anneal, and image processing core technologies.

Underpinning the latest partnerships to take shape at Creates’ Albany NanoTech Complex is the establishment of the new NanoFab Reflection facility that will also be home to Creates’ EUV Lithography Center, announced by Governor Hochul in December of 2023, which currently offers standard NA EUV lithography, with High NA EUV lithography capabilities accessible in the latter part of 2026. Related tools and components for the High NA EUV Lithography initiative have already arrived and are being assembled inside the NFR cleanroom.

The 310,000-square-foot NanoFab Reflection is a key component of Governor Hochul’s semiconductor strategy and investment in growing NY Creates’ Albany NanoTech Complex, which is already the nation’s premier public–private semiconductor R&D hub. The project will support hundreds of new permanent high-tech jobs, generate $9 billion in private investment, and harness the power of expanded partnerships with universities, workforce programs, and global semiconductor companies.

Since Governor Hochul took office, semiconductor companies have announced more than $124 billion in new investments in New York State. By 2030, the semiconductor industry estimates that one in four American-made chips will be manufactured in and around upstate New York – more than any other region in the country. This historic success will generate thousands of good-paying manufacturing jobs and bring growth and opportunity to communities across the state.

The Governor recently participated in a “topping out” ceremony of the NanoFab Reflection facility, marking the installation of the final steel beam of the building’s structure and highlighting its on-schedule construction progress. Completion of the building is anticipated by the end of 2026.

About NY Creates

NY Creates serves as a lab-to-fab bridge for advanced electronics, fostering public-private and industry-academic partnerships for technology development and innovation. NY Creates attracts and leads industry-connected innovation and commercialization projects that secure significant investment, advance R&D in emerging technologies, and generate the jobs of tomorrow. NY Creates runs some of the most advanced facilities in the world, boasts more than 2,700 industry experts and faculty, and manages public and private investments of $25 billion—placing it at the global epicenter of high-tech innovation and commercialization. Learn more at www.ny-creates.org.

About SCREEN

SCREEN Holdings is a holding company supervising four core business companies: semiconductor production equipment (SPE), graphic arts equipment (GA), display production equipment (FT), and PCB-related equipment (PE). Established in 1943, originally as a graphic arts equipment manufacturer, SCREEN has expanded its businesses into the electronics industry, driving innovation in the industries it serves. Its SPE segment is a leading manufacturer of wafer processing equipment for the semiconductor market worldwide. It consistently holds the top global share in wafer wet etching and cleaning and delivers a wide range of solutions that underpin semiconductor production, including lithography, annealing, measurement/inspection systems. Learn more at www.screen.co.jp/en.

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Media Mentions:

Brookhaven Lab and Creates Collaborative Research: A Silicon-Compatible Path Toward Scalable Quantum Systems

View Original Brookhaven National Laboratory News Release Here

Brookhaven Lab researchers built superconducting quantum devices using a new material and a technique adapted from electronics manufacturing processes

Beginning in the 1950s, silicon transformed the electronics industry by enabling smaller and faster devices that could be reliably manufactured at scale. More than six decades later, silicon-based semiconductors remain at the heart of many modern technologies, including so-called “classical” computers.

In pursuit of new quantum technologies, scientists and engineers have turned to specialized materials for building qubits — the fundamental components of quantum systems. For example, many qubits are made from superconducting materials deposited on sapphire substrates. But transitioning from laboratory demonstrations to scalable systems will require scientific and manufacturing infrastructure capable of supporting robust and reliable qubit fabrication.

Marking a milestone toward bridging that gap, researchers at the U.S. Department of Energy’s (DOE) Brookhaven National Laboratory have built superconducting quantum interference devices (SQUIDs) using a silicon-compatible class of materials called transition metal silicides. The research was conducted as part of the Co-design Center for Quantum Advantage (C2QA), a recently renewed National Quantum Information Science Research Center led by Brookhaven Lab.

“Making quantum devices with transition metal silicides is an approach that’s designed to feed right into the engine that’s been used for semiconductor technology,” said Charles Black, C2QA director, deputy associate laboratory director for Brookhaven’s Energy and Photon Sciences Directorate, and co-lead author on the paper that recently published in Nano Letters.

The researchers collaborated closely with NY Creates, a C2QA partner, to develop a fabrication process informed by advanced microelectronics manufacturing techniques. Using the lithography and etching capabilities available in the nanofabrication facility at the Center for Functional Nanomaterials (CFN) — a DOE Office of Science user facility at Brookhaven Lab — the researchers adapted a technique that is regularly used to synthesize the transition metal silicides used in microprocessors.

“We took this manufacturing-friendly approach so that, in the future, we could implement it at larger scales in the NY Creates facility,” explained Mingzhao Liu, a senior scientist at CFN, C2QA researcher, and co-lead paper author.

In this work, the researchers fabricated each SQUID with two superconducting constriction junctions, rather than using more conventional Josephson junctions, which have two superconducting layers separated by an insulator. The authors previously proposed that this architecture, in which the superconducting layers are connected by a thin wire, has potential to make transmon qubits more amenable to mass production. This new work marks their first experimental demonstration of constrictions in functioning quantum devices.

The SQUIDs served as a diagnostic tool, offering insights into how the constriction junctions were operating. Using CFN’s low-temperature measurement capabilities, the researchers cooled the devices to ultracold temperatures as low as 350 millikelvin and measured how current flowed through the SQUIDs under different applied magnetic fields.

“We learned that the design of the device as a whole can dampen the performance of the constriction junction,” Liu said. “But overall, the experiments showed us that the constriction junctions exhibit key properties, like nonlinearity, that are required for high-performing qubits.”

From nanoscale measurements to center wide collaboration

Advances like this are enabled by the integrated, multidisciplinary approach inherent to C2QA. By uniting expertise and infrastructure from national laboratories, universities, applied research and development organizations, and industry, the Center is accelerating progress toward high-performing qubits made from manufacturable, silicon-based materials.

Ekta Bhatia, NY Creates research scientist in quantum technologies and co-author on the paper remarked, “This publication reflects the power of our strong partnership with Brookhaven under C2QA and accelerates the development of scalable quantum computing. We look forward to building on this work with Brookhaven to drive quantum innovation together.”

Beyond the Brookhaven-NY Creates collaboration, other C2QA researchers continue to deliver breakthroughs in silicon-based quantum devices. In November 2025, for example, C2QA researchers at Princeton University reported record-breaking coherence times in superconducting qubits built on top of silicon substrates, demonstrating that silicon-based platforms can rival and surpass more traditional sapphire platforms.

By approaching the scaling problem from several perspectives — including device design, materials science, and large-scale manufacturing — C2QA researchers are delivering a synergistic impact that is greater than the sum of their individual achievements.

Black said, “We’re developing a pipeline to take advantage of the strengths of each C2QA partner — and making strides toward scalable quantum systems.”

C2QA is supported by the DOE Office of Science.

Brookhaven National Laboratory is supported by the Office of Science of the U.S. Department of Energy. The Office of Science is the single largest supporter of basic research in the physical sciences in the United States and is working to address some of the most pressing challenges of our time. For more information, visit science.energy.gov. Follow @BrookhavenLab on social media. Find us on Instagram, LinkedIn, X, and Facebook.

Governor Hochul Announces NY Creates Begins Installation of the First Major Tool for High NA EUV Lithography Center at Albany Nanotech Complex

TEL track being installed in NanoFab Reflection at NY Creates Albany NanoTech Complex

View the original Office of Governor Kathy Hochul News Release here.

Arrival of Tokyo Electron’s CLEAN TRACK™ LITHIUS Pro DICE™ Marks Milestone as New Center Prepares To Lead the Nation in the Future of Semiconductor Chip R&D

Governor Kathy Hochul today announced the beginning of installation of Tokyo Electron’s leading-edge 300mm wafer coater/developer system designed to support the next generation of semiconductor manufacturing at NY Creates’ Albany NanoTech Complex. This tool, called the CLEAN TRACK™ LITHIUS Pro DICE™, applies and processes a light-sensitive layer on silicon wafers, which is the platform upon which computer chips are built. This allows researchers to fabricate the minute patterns needed for the next generation of advanced processors, memory, sensors and more. This is the first major piece of equipment to be delivered for the forthcoming High NA Extreme Ultraviolet (EUV) Lithography Center at Albany NanoTech, which will be North America’s first and only publicly owned, accessible High NA EUV Lithography research site.

“New York State is leading the nation in semiconductor manufacturing and R&D, and the installation of this tool for the High NA EUV Lithography Center will allow New York to remain at the forefront of chip innovation,” Governor Hochul said. “This announcement showcases the importance of public-private partnerships and how we can work together to deliver for New Yorkers and the nation, providing cutting-edge technology to support groundbreaking manufacturing right here in this state.

In the coming months, ASML’s High NA EUV lithography system, arguably the most advanced machine ever created, will arrive in sections and be installed inside the new NanoFab Reflection (NFR) building. “First light,” when the tool’s EUV light is first turned on, is expected before the end of the year. This progress follows NFR’s “topping-out” milestone, attended by Governor Hochul in December, when construction teams put in place the building’s final steel beam.

Governor Hochul announced Creates’ High NA EUV Lithography Center in December 2023, a $10 billion partnership which includes $9 billion in industry investment and $1 billion from Empire State Development, with leaders from the semiconductor industry such as IBM, Micron, Applied Materials, Tokyo Electron, and others. The initiative is establishing a next-generation semiconductor research and development center at Creates’ Albany NanoTech Complex to support the R&D of the world’s most complex and powerful semiconductors.

Empire State Development President, CEO and Commissioner Hope Knight said, “New York State has firmly established itself as a global hub of cutting-edge semiconductor research, anchored by world-class assets like the Albany NanoTech Complex and strengthened by unprecedented public-private partnerships. Through targeted, strategic investments, we are building a robust ecosystem that accelerates innovation, supports next-generation technologies, and attracts industry leaders. These efforts are not only advancing the future of chip R&D, but also creating high-quality jobs, expanding opportunity, and securing New York’s leadership in this critical industry for decades to come.”

Senator Charles Schumer said, “The most cutting-edge extreme ultraviolet chip-making technology in the world is being installed right now in the Capital Region’s backyard. This is a major leap forward that will propel American discoveries in chipmaking that scientists today can’t even fathom. My CHIPS & Science Law has delivered major federal investment across Upstate NY to help communities from Syracuse to Albany lead the way in semiconductor manufacturing, and this state-of-the-art High NA EUV Lithography Center will help supercharge those efforts. With this new advanced chipmaking tool being installed, Albany NanoTech is leading the nation in ensuring America stays ahead of China in the race to build the future of technology. I’m grateful for Governor Hochul’s partnership in ensuring the next generation of microchips will be developed here in America, in Upstate NY, not overseas.”

NY Creates President and CEO Dave Anderson said, “As we begin installing the first major tool for our High NA EUV Lithography Center, we’re taking an important step toward enabling the most advanced semiconductor research capabilities in the world. Tokyo Electron’s LITHIUS Pro DICE system will play a foundational role in supporting High NA EUV operations and accelerating breakthroughs with our industry partners, and we are thrilled to be coordinating this initial effort with our longtime collaborators TEL Technology Center, America, based at our site, as well as ASML. This progress reflects New York’s strategic investments and our team’s commitment to driving the next generation of semiconductor innovation for the U.S. right here at our Albany NanoTech Complex.”

TEL Technology Center America (TTCA) President Alex Oscilowski said, “The installation of the LITHIUS Pro DICE system at the Albany NanoTech Complex High NA EUV Lithography Center underscores what is possible when the semiconductor ecosystem comes together with a shared commitment to innovation. As High NA EUV comes online, it will accelerate advances in AI, high-performance computing, and the technologies that will shape how the world connects, computes and creates.”

ASML Business Line High NA EUV Head Peter Vanoppen said,“High NA EUV is a critical enabler of the next generation of semiconductor innovation, and the new High NA EUV Center at the Albany NanoTech Complex will create an invaluable R&D environment for industry and research partners to collaborate on the most advanced lithography technology. ASML is proud to support next-generation development at the Center with the forthcoming delivery of an EXE:5200B lithography system, which will help strengthen the U.S. semiconductor ecosystem and accelerate innovation for the future.”

Micron Technology, Inc. EVP and Chief Technology and Product Officer Scott DeBoer said, “The arrival of the first High NA EUV process tool at NY Creates marks a major milestone for advanced semiconductor R&D in New York and the U.S. The High NA EUV Lithography Center is vital for building the R&D ecosystem that drives next-generation Memory and Logic technologies, enabling future high-performance computing and advanced AI. This complements Micron’s mega fab investment, which will create 50,000 jobs by supporting the research, talent and innovation pipeline needed for long-term success. Micron is proud to collaborate at Albany NanoTech, helping strengthen American leadership and resilience in semiconductor manufacturing.”

IBM Research GM of IBM Semiconductors and VP of Hybrid Cloud Mukesh Khare said, “This milestone is an important step forward for the High NA EUV Lithography Center and the innovation ecosystem at the Albany NanoTech Complex. IBM has a long history of pioneering advances in chip technology, including the world’s first 2nm node chip, unveiled in 2021. High NA EUV is essential for sub-2nm scaling, and this capability will accelerate breakthroughs that will shape the future of computing.”

NY Creates’ High NA EUV Lithography Center already provides industry accessibility to standard NA EUV Lithography capabilities. High NA EUV lithography capabilities will allow chip development at the most advanced technology nodes while serving as a platform for additional partner growth with access to Creates’ cutting-edge R&D infrastructure. For more information about the Center and High NA EUV, visit: https://ny-creates.org/euv-lithography-center/.

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Media Mentions:

Times Union: New EUV chip center at Albany NanoTech taking shape with deliveries [Paywall]

Photonics Spectra: Albany NanoTech Installs Wafer Coating System: Week in Brief: 04/10/26

ESD: Governor Hochul Announces NY Creates Begins Installation of the First Major Tool for High NA EUV Lithography Center at Albany Nanotech Complex

FingerLakes1.com: New chipmaking milestone in Albany signals New York’s push to lead next era of semiconductor innovation

National Today: New York Begins Installation of Key EUV Lithography Tool