<?xml version="1.0" encoding="US-ASCII"?>
<dblp>
<inproceedings key="conf/embc/AnendenSLS11" mdate="2021-12-24">
<author>Melissa P. Anenden</author>
<author orcid="0000-0002-7298-5393">Martin J. Svehla</author>
<author orcid="0000-0003-1637-1079">Nigel H. Lovell</author>
<author orcid="0000-0003-1918-3313">Gregg J. Suaning</author>
<title>Process development for dry etching polydimethylsiloxane for neural electrodes.</title>
<pages>2977-2980</pages>
<year>2011</year>
<booktitle>EMBC</booktitle>
<ee>https://doi.org/10.1109/IEMBS.2011.6090817</ee>
<ee>https://www.wikidata.org/entity/Q63456401</ee>
<crossref>conf/embc/2011</crossref>
<url>db/conf/embc/embc2011.html#AnendenSLS11</url>
</inproceedings>
</dblp>
