<?xml version="1.0"?>
<dblpperson name="Thomas J. Licata" pid="97/41" n="1">
<person key="homepages/97/41" mdate="2009-06-08">
<author pid="97/41">Thomas J. Licata</author>
</person>
<r><article key="journals/ibmrd/LicataCHL95" mdate="2020-03-13">
<author pid="97/41">Thomas J. Licata</author>
<author pid="73/4250">Evan G. Colgan</author>
<author pid="44/4495">James M. E. Harper</author>
<author pid="00/2694">Stephen E. Luce</author>
<title>Interconnect fabrication processes and the development of low-cost wiring for CMOS products.</title>
<pages>419-436</pages>
<year>1995</year>
<volume>39</volume>
<journal>IBM J. Res. Dev.</journal>
<number>4</number>
<url>db/journals/ibmrd/ibmrd39.html#LicataCHL95</url>
<ee>https://doi.org/10.1147/rd.394.0419</ee>
</article>
</r>
<coauthors n="3" nc="1">
<co c="0"><na f="c/Colgan:Evan_G=" pid="73/4250">Evan G. Colgan</na></co>
<co c="0"><na f="h/Harper:James_M=_E=" pid="44/4495">James M. E. Harper</na></co>
<co c="0"><na f="l/Luce:Stephen_E=" pid="00/2694">Stephen E. Luce</na></co>
</coauthors>
</dblpperson>

