<?xml version="1.0"?>
<dblpperson name="J. L. Sauvajol" pid="55/46" n="1">
<person key="homepages/55/46" mdate="2009-06-08">
<author pid="55/46">J. L. Sauvajol</author>
</person>
<r><article key="journals/mj/AsmarFSGKF05" mdate="2020-02-22">
<author pid="56/5129">R. Al Asmar</author>
<author pid="81/380">G. Ferblantier</author>
<author pid="55/46">J. L. Sauvajol</author>
<author pid="55/9713">Alain Giani</author>
<author pid="57/1324">A. Khoury</author>
<author pid="27/3160">A. Foucaran</author>
<title>Fabrication and characterisation of high quality ZnO thin films by reactive electron beam evaporation technique.</title>
<pages>694-699</pages>
<year>2005</year>
<volume>36</volume>
<journal>Microelectron. J.</journal>
<number>8</number>
<ee>https://doi.org/10.1016/j.mejo.2005.02.119</ee>
<url>db/journals/mj/mj36.html#AsmarFSGKF05</url>
</article>
</r>
<coauthors n="5" nc="1">
<co c="0"><na f="a/Asmar:R=_Al" pid="56/5129">R. Al Asmar</na></co>
<co c="0"><na f="f/Ferblantier:G=" pid="81/380">G. Ferblantier</na></co>
<co c="0"><na f="f/Foucaran:A=" pid="27/3160">A. Foucaran</na></co>
<co c="0"><na f="g/Giani:Alain" pid="55/9713">Alain Giani</na></co>
<co c="0"><na f="k/Khoury:A=" pid="57/1324">A. Khoury</na></co>
</coauthors>
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