Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nm.

Michael W. Cresswell

Michael W. Cresswell Richard A. Allen William F. Guthrie Christine E. Murabito Ronald G. Dixson Amy Hunt Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nm. 100-109 2008 57 IEEE Trans. Instrum. Meas. 1 https://doi.org/10.1109/TIM.2007.908313 db/journals/tim/tim57.html#CresswellAGMDH08

Nadine Pesonen Walter K. Kahn Richard A. Allen Michael W. Cresswell Mona E. Zaghloul Application of conformal mapping approximation techniques: parallel conductors of finite dimensions. 812-821 2004 53 IEEE Trans. Instrum. Meas. 3 https://doi.org/10.1109/TIM.2004.827065 db/journals/tim/tim53.html#PesonenKACZ04

William B. Penzes Richard A. Allen Michael W. Cresswell Loren W. Linholm E. Clayton Teague A new method to measure the distance between graduation lines on graduated scales. 1285-1288 2000 49 IEEE Trans. Instrum. Meas. 6 https://doi.org/10.1109/19.893272 db/journals/tim/tim49.html#PenzesACLT00

William B. Penzes Richard A. Allen Michael W. Cresswell Loren W. Linholm E. Clayton Teague A new method to measure the distance between graduation lines on graduated scales. 1178-1182 1999 48 IEEE Trans. Instrum. Meas. 6 https://doi.org/10.1109/19.816133 db/journals/tim/tim48.html#PenzesACLT99

Richard A. Allen Ronald G. Dixson William F. Guthrie Amy Hunt Walter K. Kahn Loren W. Linholm Christine E. Murabito William B. Penzes Nadine Pesonen E. Clayton Teague Mona E. Zaghloul